Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Deposition

Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations

Mewlude Imam, Konstantin Gaul, Andreas Stegmueller, Carina Höglund, Jens Jensen, Lars Hultman, Jens Birch, Ralf Tonner and Henrik Pedersen, Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations, 2015, Journal of Materials Chemistry C, (3), 41, 10898-10906. http://dx.doi.org/10.1039/c5tc02293b Copyright: Royal...

Role of gas phase reactions in subatmospheric chemical-vapor deposition ozone/TEOS processes for oxide deposition

Deposition rates, wet etch rates, and thickness uniformity experiments were performed using O3/TEOS thermal chemical-vapor deposition. Our results for oxide deposition show optimum process window around 200 Torr for producing films of good quality ~uniformity and material properties!. This is in excellent agreement with the modeling predictions over a broad range of pressure ~100–600 Torr! and ...

Chemical Kinetics of Photoinduced Chemical Vapor Deposition: Silica Coating of Gas-Phase Nanoparticles

Experimental studies of gas-phase nanoparticle coating by photoinduced chemical vapor deposition (photoCVD) have shown that silica coatings can be produced with controllable thicknesses on different nanoparticle cores for a variety of applications. This study presents a chemical reaction sequence for the photo-CVD process to describe the production of silica coatings from the decomposition of t...

Trimethylboron as Single-Source Precursor for Boron−Carbon Thin Film Synthesis by Plasma Chemical Vapor Deposition

Boron−carbon (BxC) thin films are potential neutron converting layers for B-based neutron detectors. However, as common material choices for such detectors do not tolerate temperatures above 500 °C, a low temperature deposition route is required. Here, we study trimethylboron B(CH3)3 (TMB) as a single-source precursor for the deposition of BxC thin films by plasma CVD using Ar plasma. The effec...

Studying chemical vapor deposition processes with theoretical chemistry